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US Patent 11566325 Silicon carbonitride gapfill with tunable carbon content
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Edits on 1 Feb, 2023
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Golden AI
created this topic on 1 Feb, 2023
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US Patent 11566325 Silicon carbonitride gapfill with tunable carbon content
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Is a
Patent
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Patent Applicant
Applied Materials
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Current Assignee
Applied Materials
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11566325
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Date of Patent
January 31, 2023
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Patent Application Number
17120494
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Date Filed
December 14, 2020
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Patent Citations
US Patent 10096466 Pulsed plasma for film deposition
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Patent Primary Examiner
Elizabeth A Burkhart
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CPC Code
C23C 16/50
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C23C 16/4408
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C23C 16/36
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