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US Patent 11574811 Tight pitch patterning
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Patent
Date Filed
September 23, 2019
Date of Patent
February 7, 2023
Patent Application Number
16579350
Patent Citations
US Patent 10177037 Methods of forming a CT pillar between gate structures in a semiconductor
US Patent 10056469 Gate cut integration and related device
US Patent 10014175 Lithography using high selectivity spacers for pitch reduction
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11574811
Patent Primary Examiner
Jae Lee
CPC Code
H01L 21/22
H01L 21/0334
H01L 21/0337
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