US Patent 11605477 EUV lithography apparatus
Patent 11605477 was granted and assigned to Taiwan Semiconductor Manufacturing Company on March, 2023 by the United States Patent and Trademark Office.
All edits
Edits on 16 Oct, 2024
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 25 Apr, 2023
Golden AI
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
116054770
Date of Patent
March 14, 2023
0Patent Application Number
174601420
Date Filed
August 27, 2021
0Patent Primary Examiner
Edits on 15 Mar, 2023
Golden AI
Edits made to:
Infobox (+15 properties)
Article (+368 characters)
US Patent 11605477 EUV lithography apparatus
Article
An extreme ultra violet (EUV) light source apparatus includes a metal droplet generator, a collector mirror, an excitation laser inlet port for receiving an excitation laser, a first mirror configured to reflect the excitation laser that passes through a zone of excitation, and a second mirror configured to reflect the excitation laser reflected by the first mirror.
Infobox
Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
116054770
Date of Patent
March 14, 2023
0Patent Application Number
174601420
Date Filed
August 27, 2021
0Patent Primary Examiner
Find more entities like US Patent 11605477 EUV lithography apparatus
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
