Patent attributes
A method for processing a forksheet device includes providing a substrate and forming a trench in the substrate, extending along a first direction, in the substrate. The formation of the trench includes forming a grating structure on the substrate that includes a pair of maskings, arranged at a distance from each other, and etching the trench into the substrate in a region between the pair of maskings. The method also includes filling the trench with a filling material and partially recessing the substrate to form a fin structure. This fin structure includes the filled trench, a first section of the substrate at a first side of the filled trench and a second section of the substrate at a second side of the filled trench, and forming a gate structure on and around the fin structure. The method additionally includes forming a gate structure on and around the fin structure.
