Patent 11634213 was granted and assigned to Goodrich Corporation on April, 2023 by the United States Patent and Trademark Office.
An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.