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US Patent 11658016 Shield for a substrate processing chamber
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Patent
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Applied Materials
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Date Filed
May 10, 2019
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Date of Patent
May 23, 2023
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Patent Applicant
Applied Materials
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Patent Application Number
16409757
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Patent Citations
US Patent 7476289 Vacuum elastomer bonding apparatus and method
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US Patent 7504008 Refurbishment of sputtering targets
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US Patent 7550055 Elastomer bonding of large area sputtering target
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US Patent 9127362 Process kit and target for substrate processing chamber
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US Patent 7588668 Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers
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US Patent 7115193 Sputtering target producing very few particles, backing plate or apparatus within sputtering device and roughening method by electric discharge machining
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US Patent 7131883 Field emission display manufacturing method having integrated getter arrangement
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US Patent 7146703 Low temperature sputter target/backing plate method and assembly
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US Patent 7175802 Refurbishing spent sputtering targets
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US Patent 7331250 Sensor device for non-intrusive diagnosis of a semiconductor processing system
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11658016
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Patent Primary Examiner
John J Brayton
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CPC Code
H01J 37/3441
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