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US Patent 11674225 Substrate processing apparatus
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Patent
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Current Assignee
Tokyo Electron
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Date Filed
January 4, 2018
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Date of Patent
June 13, 2023
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Patent Applicant
Tokyo Electron
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Patent Application Number
15862190
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Patent Citations
US Patent 10072336 Film forming apparatus, film forming method, and recording medium
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US Patent 11248294 Substrate processing apparatus
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US Patent 11422008 Rotation angle detection apparatus and rotation angle detection method, and substrate processing apparatus and substrate processing method using same
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US Patent 10221480 Substrate processing apparatus and substrate processing method
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US Patent 10246775 Film forming apparatus, method of forming film, and storage medium
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US Patent 10584416 Substrate processing apparatus
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US Patent 10683573 Film forming apparatus
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11674225
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Patent Primary Examiner
Jeffrie R. Lund
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CPC Code
C23C 14/228
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C23C 14/26
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C23C 14/505
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C23C 16/402
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C23C 16/4408
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C23C 16/4409
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C23C 16/45527
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C23C 16/45536
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C23C 16/45542
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C23C 16/45544
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