US Patent 11679531 Chemical mechanical polishing pad and preparation thereof
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US Patent 11679531 Chemical mechanical polishing pad and preparation thereof
Article
The present invention concerns a chemical mechanical polishing pad having a polishing layer. The polishing layer contains an extruded sheet. The extruded sheet is prepared by extruding a compounded photopolymerizable composition followed by exposure to UV light.
Infobox
Is a
Patent Jurisdiction
Patent Number
116795310
Date of Patent
June 20, 2023
0Patent Application Number
175006690
Date Filed
October 13, 2021
0Patent Citations
Patent Primary Examiner
CPC Code
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