Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 27, 2023
0Patent Application Number
173384260
Date Filed
June 3, 2021
0Patent Citations
Patent Primary Examiner
A method includes following steps. A silicon germanium layer is formed on a substrate. A surface layer of the silicon germanium layer is oxidized to form an interfacial layer comprising silicon oxide and germanium oxide. The interfacial layer is nitridated. A metal gate structure is formed over the nitridated interfacial layer.
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