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US Patent 11693312 Radiation based patterning methods
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Patent
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Current Assignee
Inpria
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Date Filed
August 25, 2022
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Date of Patent
July 4, 2023
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Patent Applicant
Inpria
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Patent Application Number
17895657
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Patent Citations
US Patent 9679095 Layout decomposition for multiple patterning lithography
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US Patent 10228618 Organotin oxide hydroxide patterning compositions, precursors, and patterning
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US Patent 10627719 Methods of reducing metal residue in edge bead region from metal-containing resists
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US Patent 10649328 Pre-patterned lithography templates, processes based on radiation patterning using the templates and processes to form the templates
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US Patent 10642153 Organometallic solution based high resolution patterning compositions and corresponding methods
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US Patent 7208341 Method for manufacturing printed circuit board
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US Patent 7256129 Method for fabricating semiconductor device
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US Patent 8092703 Manufacturing method of semiconductor device
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US Patent 8257910 Underlayers for EUV lithography
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US Patent 8415000 Patterned inorganic layers, radiation based patterning compositions and corresponding methods
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Patent Jurisdiction
United States Patent and Trademark Office
0
Patent Number
11693312
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Patent Primary Examiner
Chanceity N Robinson
0
CPC Code
G03F 7/20
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