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US Patent 11713959 Overlay metrology using spectroscopic phase
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Patent
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Date Filed
March 17, 2021
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Date of Patent
August 1, 2023
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Patent Application Number
17204595
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Patent Citations
US Patent 10352876 Signal response metrology for scatterometry based overlay measurements
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US Patent 9909983 Method and apparatus for improving measurement accuracy
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US Patent 10769320 Integrated use of model-based metrology and a process model
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US Patent 7478019 Multiple tool and structure analysis
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US Patent 7933026 High resolution monitoring of CD variations
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11713959
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Patent Primary Examiner
Michael A Lyons
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CPC Code
G03F 7/70633
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G01B 9/02044
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G01B 9/0201
0
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