Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Srinivas D. Nemani
Sultan Malik
Qiwei Liang
Adib M. Khan
Date of Patent
September 5, 2023
Patent Application Number
16706115
Date Filed
December 6, 2019
Patent Citations
...
Patent Primary Examiner
Embodiments of the disclosure relate to an apparatus and method for processing semiconductor substrates. In one embodiment, a processing system is disclosed. The processing system includes an outer chamber that surrounds an inner chamber. The inner chamber includes a substrate support upon which a substrate is positioned during processing. The inner chamber is configured to have an internal volume that, when isolated from an internal volume of the outer chamber, is changeable such that the pressure within the internal volume of the inner chamber may be varied.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.