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US Patent 11769813 Semiconductor devices
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Patent
Date Filed
October 14, 2022
Date of Patent
September 26, 2023
Patent Application Number
18046518
Patent Citations
US Patent 9805988 Method of forming semiconductor structure including suspended semiconductor layer and resulting structure
US Patent 9953885 STI shape near fin bottom of Si fin in bulk FinFET
US Patent 10566245 Method of fabricating gate all around semiconductor device
US Patent 10453752 Method of manufacturing a gate-all-around semiconductor device
US Patent 11557653 Semiconductor devices
US Patent 8916460 Semiconductor device and method for fabricating the same
US Patent 9412816 Semiconductor device including multiple nanowire transistor
Patent Inventor Names
Myung Gil Kang
Woo Seok Park
Dong Won Kim
Keun Hwi Cho
Sung Gi Hur
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11769813
Patent Primary Examiner
David C Spalla
CPC Code
H01L 27/0924
H01L 27/1211
H01L 29/0665
H01L 29/0669
H01L 29/0673
H01L 29/41791
H01L 29/4236
H01L 29/42392
H01L 29/66439
H01L 29/66795
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