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US Patent 11789368 Lithographic apparatus, metrology system, and illumination systems with structured illumination

Patent 11789368 was granted and assigned to ASML Holding on October, 2023 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Patent Applicant

ASML Holding

Current Assignee

ASML Holding

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

11789368

Patent Inventor Names

Joshua Adams

Krishanu Shome

Tamer Mohamed Tawfik Ahmed Mohamed Elazhary

Yuxiang Lin

Date of Patent

October 17, 2023

Patent Application Number

17764139

Date Filed

September 14, 2020

Patent Citations

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US Patent 8706442 Alignment system, lithographic system and method

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US Patent 7511799 Lithographic projection apparatus and a device manufacturing method

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US Patent 10852247 Variable corrector of a wave front

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Patent abstract

A system (

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