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US Patent 11791199 Nanosheet IC device with single diffusion break
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Patent
Date Filed
August 19, 2021
Date of Patent
October 17, 2023
Patent Application Number
17406351
Patent Citations
US Patent 9412616 Methods of forming single and double diffusion breaks on integrated circuit products comprised of FinFET devices and the resulting products
US Patent 9741792 Bulk nanosheet with dielectric isolation
US Patent 10032867 Forming bottom isolation layer for nanosheet technology
US Patent 10269928 Semiconductor devices having 3D channels, and methods of fabricating semiconductor devices having 3D channels
US Patent 10388519 Method and device for incorporating single diffusion break into nanochannel structures of FET devices
US Patent 10734224 Method and device for incorporating single diffusion break into nanochannel structures of FET devices
US Patent 10665669 Insulative structure with diffusion break integral with isolation layer and methods to form same
US Patent 10985161 Single diffusion break isolation for gate-all-around field-effect transistor devices
US Patent 8609510 Replacement metal gate diffusion break formation
US Patent 9406676 Method for forming single diffusion breaks between finFET devices and the resulting devices
Patent Inventor Names
Ruilong Xie
Juntao Li
Carl Radens
Kangguo Cheng
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
11791199
Patent Primary Examiner
Thinh T Nguyen
CPC Code
H01L 29/42392
H01L 29/0673
H01L 29/0649
H01L 21/84
H01L 21/76283
H01L 27/1203
H01L 29/6656
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