Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chien-Hsien Liu0
Date of Patent
November 28, 2023
0Patent Application Number
176805140
Date Filed
February 25, 2022
0Patent Primary Examiner
CPC Code
Patent abstract
The present application provides an overlay measuring apparatus, adapted to determine relative positions of two or more successive patterned layers of a device. The overlay measuring apparatus includes a stage and an imaging assembly. The device is placed on the stage. The imaging assembly includes a plurality of optical heads and a plurality of overlay marks assembled on the optical heads. The relative positions of the two or more successive patterned layers of the device are determined using light reflected from the device and passing through the overlay mark mounted on the respective optical head.
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