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US Patent 11837504 Self-aligned structure for semiconductor devices

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
March 8, 2021
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Date of Patent
December 5, 2023
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Patent Application Number
17195282
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Patent Citations
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US Patent 9190417 Fin-like field effect transistor (FinFET) device and method of manufacturing same
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US Patent 10204202 Dummy fin cell placement in an integrated circuit layout
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US Patent 10403714 Fill fins for semiconductor devices
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US Patent 10294605 Heat pump laundry treatment apparatus and method of operating a heat pump laundry treatment apparatus
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US Patent 10304844 Stacked FinFET EEPROM
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US Patent 10304946 Vertical integration scheme and circuit elements architecture for area scaling of semiconductor devices
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US Patent 10347751 Self-aligned epitaxy layer
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US Patent 10374082 Semiconductor device
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US Patent 10607890 Selective removal of semiconductor fins
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US Patent 8298913 Devices with gate-to-gate isolation structures and methods of manufacture
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•••
Patent Inventor Names
Chih-Hao Wang
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Shi Ning Ju
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Kuan-Lun Cheng
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Kuo-Cheng Chiang
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Kuan-Ting Pan
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11837504
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Patent Primary Examiner
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Evren Seven
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