Patent attributes
The present disclosure relates to a metasurface arrangement including a first metasurface and a second metasurface which run mutually parallel and face each other. Each metasurface includes a corresponding periodic or quasi-periodic structure formed in a respective pattern. The first metasurface is formed in a dielectric material structure and the second metasurface is formed in either a dielectric material structure or in an electrically conducting structure. The periodic or quasi-periodic structure on the first metasurface is configured to yield a first response to an incident electromagnetic wave between the two metasurfaces, and the periodic or quasi-periodic structure on the second metasurface is configured to yield a second response to the incident electromagnetic wave between the two metasurfaces that is equivalent to the first response, thereby rendering the two metasurfaces mutually electromagnetically symmetric.
