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US Patent 11843040 MIS contact structure with metal oxide conductor
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Patent
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Date Filed
November 10, 2020
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Date of Patent
December 12, 2023
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Patent Application Number
17094651
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Patent Citations
US Patent 7084423 Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
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US Patent 9209261 Method for depinning the fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
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US Patent 9287138 FinFET low resistivity contact formation method
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US Patent 9362376 Metal contacts to group IV semiconductors by inserting interfacial atomic monolayers
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US Patent 9425277 Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
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US Patent 9461167 Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
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US Patent 9905691 Method for depinning the fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
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US Patent 9978835 Semiconductor device including nanowire transistor
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US Patent 10090395 Method for depinning the Fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
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US Patent 10147798 MIS contact structure with metal oxide conductor
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•••
Patent Inventor Names
Paul A. Clifton
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Andreas Goebel
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11843040
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Patent Primary Examiner
Kyoung Lee
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CPC Code
H01L 21/28017
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H01L 29/517
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H01L 29/36
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H01L 29/4966
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