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US Patent 11851511 Polymerization photoinhibitor

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
October 13, 2021
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Date of Patent
December 26, 2023
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Patent Application Number
17500151
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Patent Citations
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US Patent 7902526 3D two-photon lithographic microfabrication system
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US Patent 7935476 Negative laser sensitive lithographic printing plate having specific photosensitive composition
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US Patent 8119214 Encapsulated cure systems
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US Patent 8232043 Method of making a lithographic printing plate
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US Patent 8697346 Diffraction unlimited photolithography
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US Patent 9205601 Continuous liquid interphase printing
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US Patent 9216546 Method and apparatus for three-dimensional fabrication with feed through carrier
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US Patent 10245785 Methods for stereolithography three-dimensional printing
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US Patent 10166725 Three dimensional printing adhesion reduction using photoinhibition
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US Patent 11174326 Polymerization photoinhibitor
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•••
Patent Inventor Names
Mark A. Burns
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Megan A. Cole
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Timothy F. Scott
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Avi Bregman
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Zachary D. Pritchard
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Martin P. De Beer
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Harry van der Laan
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11851511
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Patent Primary Examiner
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Jessica Whiteley
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CPC Code
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C08F 2/50
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C08F 222/40
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C08F 4/04
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C08F 222/10
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C08F 222/12
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C08F 4/40
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