Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Mei-Yun Wang0
I-Wen Wu0
Chen-Ming Lee0
Fu-Kai Yang0
Date of Patent
December 26, 2023
0Patent Application Number
174440680
Date Filed
July 30, 2021
0Patent Citations
Patent Primary Examiner
Patent abstract
Methods and devices including an air gap adjacent a contact element extending to a source/drain feature of a device are described. Some embodiments of the method include depositing a dummy layer, which is subsequently removed to form the air gap. The dummy layer and subsequent air gap may be formed after a SAC dielectric layer such as silicon nitride is formed over an adjacent metal gate structure.
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