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US Patent 11859284 Shower head structure and plasma processing apparatus using the same

Patent 11859284 was granted and assigned to Taiwan Semiconductor Manufacturing Company on January, 2024 by the United States Patent and Trademark Office.

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Patent abstract

A shower head structure and a plasma processing apparatus are provided. The shower head structure includes a plate body with a first zone and a second zone on a first surface. A plurality of first through holes are in the first zone, each of the first through holes having a diameter uniform with others of the first through holes. A plurality of second through holes are in the second zone. The first zone is in connection with the second zone, and the diameter of each of the first through holes is greater than a diameter of each of the second through holes. A plasma processing apparatus includes the shower head structure is also provided.

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