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US Patent 11880142 Self-calibrating overlay metrology

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
March 7, 2023
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Date of Patent
January 23, 2024
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Patent Application Number
18118420
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Patent Citations
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US Patent 7933026 High resolution monitoring of CD variations
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US Patent 9291554 Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection
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US Patent 9885962 Methods and apparatus for measuring semiconductor device overlay using X-ray metrology
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US Patent 9915522 Optimized spatial modeling for optical CD metrology
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US Patent 10013518 Model building and analysis engine for combined X-ray and optical metrology
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US Patent 10324050 Measurement system optimization for X-ray based metrology
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US Patent 10101670 Statistical model-based metrology
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US Patent 10352695 X-ray scatterometry metrology for high aspect ratio structures
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US Patent 7478019 Multiple tool and structure analysis
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US Patent 7929667 High brightness X-ray metrology
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Patent Inventor Names
Jonathan Madsen
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Stilian Pandev
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Liran Yerushalmi
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Mahendra Dubey
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Alexander Kuznetsov
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Andrei V. Shchegrov
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Min-Yeong Moon
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Dimitry Sanko
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11880142
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Patent Primary Examiner
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Christopher G Young
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CPC Code
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G03F 7/70775
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G03F 7/70633
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G03F 7/70516
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