Patent attributes
The present disclosure relates to a radiation system. The system may include a treatment assembly, an imaging assembly, a first gantry, and a second gantry. The treatment assembly may include a first radiation source configured to deliver a treatment beam and have a treatment region. The first gantry may be configured to support the first radiation source. The imaging assembly may include a second radiation source and a radiation detector. The second radiation source may be configured to deliver an imaging beam and the radiation detector may be configured to detect at least a portion of the imaging beam. The imaging assembly may have an imaging region. The second gantry may be configured to support the second radiation source and the radiation detector, wherein the second radiation source is located within the second gantry. The treatment region and the imaging region at least partially overlap.