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US Patent 11914407 Flow rate control device

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Hiroyuki Ito0

Kaoru Hirata0

Kouji Nishino0

Keisuke Ideguchi0

Masaaki Nagase0

Katsuyuki Sugita0

Nobukazu Ikeda0

Shinya Ogawa0

Date of Patent

February 27, 2024

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Patent Application Number

176059480

Date Filed

April 16, 2020

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Patent Citations

US Patent 8944095 Gas supply apparatus for semiconductor manufacturing apparatus

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US Patent 10054959 Real time diagnostics for flow controller systems and methods

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US Patent 10534376 Gas divided flow supplying apparatus for semiconductor manufacturing equipment

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US Patent 10996689 Flow rate ratio control device with flow velocity control mode

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US Patent 10921828 Fluid control apparatus and flow rate ratio control apparatus

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US Patent 11526181 Mass flow controller with absolute and differential pressure transducer

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US Patent 7059363 Method of supplying divided gas to a chamber from a gas supply apparatus equipped with a flow-rate control system

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US Patent 7143774 Method and apparatus for providing a determined ratio of process fluids

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Patent Primary Examiner

William M McCalister

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CPC Code

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Patent abstract

The flow rate control device

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