Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kok How Tan0
Xu Shi0
Ming Chu Yang0
Date of Patent
March 12, 2024
0Patent Application Number
174376460
Date Filed
March 13, 2020
0Patent Citations
Patent Primary Examiner
Patent abstract
A cathode arc source comprises: a cathode target; a first magnetic field source located above the target; a second magnetic field source located below the target; and a third magnetic field source located between the first and second magnetic field sources and having an opposite polarity to the first magnetic field source; wherein the resultant magnetic field from the first, second and third magnetic field sources has zero field strength in a direction substantially normal to the target at a position above the target. The invention also provides methods of striking a cathode target and methods of depositing coatings which can be carried out using the cathode arc source described herein.
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