Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Hsi Chung Chen0
Chih-Teng Liao0
Chih-Hsuan Lin0
Date of Patent
March 19, 2024
0Patent Application Number
173037940
Date Filed
June 8, 2021
0Patent Citations
0
...
Patent Primary Examiner
Patent abstract
A semiconductor structure includes a substrate, a conductive region, a first insulation layer, a second insulation layer, a gate structure, a low-k spacer, a gate contact, and a conductive region contact. The low-k spacer is formed between a sidewall of the gate structure and the first insulation layer. The gate contact is landed on a top surface of the gate structure. A proximity distance between a sidewall of the gate contact and the conductive region contact along a top surface of the second insulation layer is in a range of from about 4 nm to about 7 nm. A method for manufacturing a semiconductor structure is also provided.
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