US Patent 11948796 Selective methods for fabricating devices and structures
Patent 11948796 was granted and assigned to Applied Materials on April, 2024 by the United States Patent and Trademark Office.
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US Patent 11948796 Selective methods for fabricating devices and structures
Article
Patent abstract
One or more embodiments described herein relate to selective methods for fabricating devices and structures. In these embodiments, the devices are exposed inside the process volume of a process chamber. Precursor gases are flowed in the process volume at certain flow ratios and at certain process conditions. The process conditions described herein result in selective epitaxial layer growth on the {
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Abhishek Dube0
Chen-Ying Wu0
Chia Cheng Chin0
Saurabh Chopra0
Yi-Chiau Huang0
Date of Patent
April 2, 2024
0Patent Application Number
176161310
Date Filed
June 10, 2020
0Patent Citations
Patent Primary Examiner
CPC Code
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