US Patent 11953725 Grating coupler and method of manufacturing the same
Patent 11953725 was granted and assigned to Taiwan Semiconductor Manufacturing Company on April, 2024 by the United States Patent and Trademark Office.
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US Patent 11953725 Grating coupler and method of manufacturing the same
Article
Patent abstract
A device includes a dielectric layer, a plurality of grating structures, and a dielectric material between the plurality of grating structures and on top of the plurality of grating structures. The grating structures are arranged on the dielectric layer and separated from each other, the plurality of grating structures each having a bottom portion and top portion, the top portion having a first width and the bottom portion having a second width, the second width being larger than the first width.
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Is a
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chewn-Pu Jou0
Feng-Wei Kuo0
Hsing-Kuo Hsia0
Date of Patent
April 9, 2024
0Patent Application Number
174466690
Date Filed
September 1, 2021
0Patent Citations
Patent Primary Examiner
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