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US Patent 11963285 Target material control in an EUV light source

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
March 9, 2020
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Date of Patent
April 16, 2024
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Patent Application Number
17435861
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Patent Citations
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US Patent 8154000 Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources
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US Patent 10495974 Target feeding system
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US Patent 7122816 Method and apparatus for EUV light source target material handling
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US Patent 10331035 Light source for lithography exposure process
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Patent Inventor Names
Jon David Tedrow
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Petrus Adrianus Willems
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Sandeep Rai
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Serkan Kincal
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Joshua Mark Lukens
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David Bessems
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Abhiram Lakshmi Ganesh Govindaraju
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11963285
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Patent Primary Examiner
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Kiet T Nguyen
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CPC Code
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G03F 7/70033
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H05G 2/008
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H05G 2/006
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