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US Patent 11967647 Localized heating in laser annealing process
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Patent
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Date Filed
June 28, 2021
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Date of Patent
April 23, 2024
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Patent Application Number
17361141
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Patent Citations
US Patent 10062692 Field effect transistors with reduced parasitic resistances and method
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US Patent 11069813 Localized heating in laser annealing process
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US Patent 9548381 Method and structure for III-V nanowire tunnel FETs
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US Patent 10134856 Semiconductor device including contact plug and method of manufacturing the same
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Patent Inventor Names
Blandine Duriez
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Gerben Doornbos
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Martin Christopher Holland
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Georgios Vellianitis
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Marcus Johannes Henricus Van Dal
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
11967647
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Patent Primary Examiner
Ratisha Mehta
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CPC Code
H01L 21/31116
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H01L 21/324
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H01L 29/0673
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H01L 29/42392
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H01L 29/45
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H01L 29/66515
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H01L 29/66742
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H01L 29/78696
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H01L 21/28568
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H01L 21/268
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