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US Patent 11972927 Frequency tuning for modulated plasma systems

Patent 11972927 was granted and assigned to ADVANCED ENERGY INDUSTRIES, INC. on April, 2024 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Date Filed
October 26, 2022
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Date of Patent
April 30, 2024
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Patent Applicant
ADVANCED ENERGY INDUSTRIES, INC.
ADVANCED ENERGY INDUSTRIES, INC.
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Patent Application Number
17973969
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Patent Citations
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US Patent 7970562 System, method, and apparatus for monitoring power
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US Patent 8018164 Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources
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US Patent 8330432 Efficient active source impedance modification of a power amplifier
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US Patent 8576013 Power distortion-based servo control systems for frequency tuning RF power sources
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US Patent 9059678 TCCT match circuit for plasma etch chambers
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US Patent 9595424 Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes
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US Patent 9596744 Radio frequency generator having multiple mutually exclusive oscillators for use in plasma processing
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US Patent 9635750 Oscillator generators and methods of using them
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US Patent 9721759 System and method for distributing RF power to a plasma source
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US Patent 9773643 Apparatus and method for deposition and etch in gap fill
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•••
Patent Inventor Names
Gideon Van Zyl
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
11972927
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Patent Primary Examiner
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Srinivas Sathiraju
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