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US Patent 11984301 Edge ring, substrate support, substrate processing apparatus and method

Patent 11984301 was granted and assigned to Tokyo Electron on May, 2024 by the United States Patent and Trademark Office.

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Patent abstract

An edge ring includes a first edge ring, and a second edge ring that has a side surface adjacent to a side surface of the first edge ring and is movable in a vertical direction along the side surface of the first edge ring. Further, the side surface of the first edge ring and the side surface of the second edge ring at least partially face each other in a movement range of the second edge ring.

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