US Patent 11988958 Organometallic solution based high resolution patterning compositions
Patent 11988958 was granted and assigned to Inpria on May, 2024 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
August 9, 2019
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Date of Patent
May 21, 2024
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Patent Applicant
Patent Application Number
16536768
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Patent Citations
•••
Patent Inventor Names
Kai Jiang
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Jeremy T. Anderson
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Stephen T. Meyers
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Andrew Grenville
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Douglas A. Keszler
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
CPC Code
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