Log in
Sign up
Golden has been acquired by ComplyAdvantage.Read about it here ⟶
‌

US Patent 12002652 Variable mode plasma chamber utilizing tunable plasma potential

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
November 29, 2021
0
Date of Patent
June 4, 2024
0
Patent Application Number
17536733
0
Patent Citations
‌
US Patent 11255606 Gas flow control for millisecond anneal system
0
‌
US Patent 11348767 Plasma processing apparatus having a focus ring adjustment assembly
0
‌
US Patent 11348784 Enhanced ignition in inductively coupled plasmas for workpiece processing
0
‌
US Patent 11387111 Processing of workpieces with reactive species generated using alkyl halide
0
‌
US Patent 11387115 Silicon mandrel etch after native oxide punch-through
0
‌
US Patent 11495437 Surface pretreatment process to improve quality of oxide films produced by remote plasma
0
‌
US Patent 6974550 Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator
0
‌
US Patent 7100532 Plasma production device and method and RF driver circuit with adjustable duty cycle
0
‌
US Patent 7232767 Slotted electrostatic shield modification for improved etch and CVD process uniformity
0
‌
US Patent 7426900 Integrated electrostatic inductive coupling for plasma processing
0
•••
Patent Inventor Names
Stephen E. Savas
0
Shawming Ma
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
12002652
0
Patent Primary Examiner
‌
Srinivas Sathiraju
0

Find more entities like US Patent 12002652 Variable mode plasma chamber utilizing tunable plasma potential

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Golden Query Tool
Golden logo