A temporal Atomic Layer Deposition system and method utilizing precursor pulses applied to a moving substrate. The precursor pulses are self-exhausting.

Timeline

No Timeline data yet.

Further Resources

Title

Author

Link

Type

Date

No Further Resources data yet.

References

Find more entities like US Patent 12006570 Atomic layer deposition for continuous, high-speed thin films

Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.

Open Query Tool

Access by API

US Patent 12006570 Atomic layer deposition for continuous, high-speed thin films

Contents

Patent attributes

Timeline

Further Resources

References

Find more entities like US Patent 12006570 Atomic layer deposition for continuous, high-speed thin films