Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dong Hyung Lee0
Kwangduk Douglas Lee0
Prashant Kumar Kulshreshtha0
Sarah Bobek0
Rajesh Prasad0
Harry Whitesell0
Hidetaka Oshio0
Deven Matthew Raj Mittal0
...
Date of Patent
June 18, 2024
0Patent Application Number
179638410
Date Filed
October 11, 2022
0Patent Citations
...
Patent Primary Examiner
Patent abstract
Methods and techniques for deposition of amorphous carbon films on a substrate are provided. In one example, the method includes depositing an amorphous carbon film on an underlayer positioned on a susceptor in a first processing region. The method further includes implanting a dopant or the inert species into the amorphous carbon film in a second processing region. The implant species, energy, dose & temperature in some combination may be used to enhance the hardmask hardness. The method further includes patterning the doped amorphous carbon film. The method further includes etching the underlayer.
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