Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Olger Victor Zwier0
Maurits Van Der Schaar0
Patrick Warnaar0
Date of Patent
June 25, 2024
0Patent Application Number
172995310
Date Filed
December 4, 2019
0Patent Citations
...
Patent Primary Examiner
Patent abstract
A target for determining a performance parameter of a lithographic process, the target comprising a first sub-target formed by at least two overlapping gratings, wherein the underlying grating of the first sub-target has a first pitch and the top lying grating of the first sub-target has a second pitch, at least a second sub-target formed by at least two overlapping gratings, wherein the underlying grating of the second sub-target has a third pitch and the top lying grating of the second sub-target has a fourth pitch.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
