Patent attributes
Disclosed is an HF plasma generator for generating an inductively coupled plasma in spectrometry, comprising a voltage supply device with a DC voltage source, an oscillator circuit connected to the power supply device for generating HF power, and a load circuit coupled to the oscillator circuit for generating the plasma, said load circuit having at least one induction coil and one capacitor connected in parallel. The HF plasma generator comprises at least one controllable voltage source arranged in a branch of the oscillator circuit. The controllable voltage source is designed to set a voltage applied to the load circuit and/or at least one potential difference between the induction coil and a spectrometer, in particular a cone of the spectrometer. Further disclosed is a spectrometer having an HF plasma generator.
