Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Alexey Stepanov0
Shandon Alderson0
Eliyahu Vronsky0
Justin Mauck0
Alexander Sou-Kang Ko0
Date of Patent
August 20, 2024
0Patent Application Number
181856310
Date Filed
March 17, 2023
0Patent Citations
Patent Primary Examiner
Patent abstract
A method comprises processing a substrate in a gas enclosure to form a film on one or more portions of the substrate. The method further comprises, while processing the substrate, circulating gas along a circulation path through the gas enclosure. Circulating the gas may comprise flowing gas through an exhaust housing enclosing a printhead assembly housed in the gas enclosure and filtering the gas flowing downstream of the printhead assembly from the exhaust housing.
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