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US Patent 12080558 Low temperature deposition of pure molybdenum films

Patent 12080558 was granted and assigned to Applied Materials on September, 2024 by the United States Patent and Trademark Office.

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Patent abstract

Methods for depositing molybdenum films on a substrate are described. The substrate is exposed to a molybdenum halide precursor and an aluminum precursor to form the molybdenum film (e.g., elemental molybdenum) at a low temperature. The exposures can be sequential or simultaneous.

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