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US Patent 12082509 Dual magnetic tunnel junction (DMTJ) stack design

Patent 12082509 was granted and assigned to Taiwan Semiconductor Manufacturing Company on September, 2024 by the United States Patent and Trademark Office.

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Patent attributes

Patent Applicant

Taiwan Semiconductor Manufacturing Company

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Current Assignee

Taiwan Semiconductor Manufacturing Company

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Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Ru-Ying Tong0

Yu-Jen Wang0

Sahil Patel0

Luc Thomas0

Vignesh Sundar0

Guenole Jan0

Date of Patent

September 3, 2024

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Patent Application Number

170633920

Date Filed

October 5, 2020

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Patent Citations

US Patent 7241631 MTJ elements with high spin polarization layers configured for spin-transfer switching and spintronics devices using the magnetic elements

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US Patent 6847510 Magnetic tunnel junction device with bottom free layer and improved underlayer

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US Patent 6974708 Oxidation structure/method to fabricate a high-performance magnetic tunneling junction MRAM

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US Patent 6977801 Magnetoresistive device with exchange-coupled structure having half-metallic ferromagnetic Heusler alloy in the pinned layer

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US Patent 7027268 Method and system for providing a dual spin filter

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US Patent 7180713 Magnetoresistive element

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US Patent 8456882 Method and system for providing dual magnetic tunneling junctions usable in spin transfer torque magnetic memories

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US Patent 8462461 Spin-torque oscillator (STO) with magnetically damped free layer

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Patent Primary Examiner

Michelle Mandala

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CPC Code

0

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Patent abstract

A dual magnetic tunnel junction (DMTJ) is disclosed with a PL

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