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US Patent 12092965 Process variability aware adaptive inspection and metrology

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
May 6, 2021
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Date of Patent
September 17, 2024
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Patent Application Number
17313135
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Patent Citations
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US Patent 8200468 Methods and system for lithography process window simulation
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US Patent 6999164 Measurement system cluster
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US Patent 7618755 Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields
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US Patent 9188554 Pattern inspection device and pattern inspection method
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US Patent 9507907 Computational wafer inspection
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US Patent 9842186 Process window identifier
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US Patent 9990451 Process window optimizer
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US Patent 9990462 Computational wafer inspection
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US Patent 10514614 Process variability aware adaptive inspection and metrology
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US Patent 10579772 Computational wafer inspection
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Patent Inventor Names
Venugopal Vellanki
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Vivek Kumar Jain
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Stefan Hunsche
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12092965
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Patent Primary Examiner
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Phallaka Kik
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CPC Code
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G03F 7/70525
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G03F 7/70641
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G03F 7/70666
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G03F 1/60
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G03F 1/84
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G06N 20/00
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G06F 30/398
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G06F 30/20
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G06F 2119/18
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G03F 7/7065
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•••

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