Patent attributes
A semiconductor device and cleaning system are provided. The semiconductor device includes: a device chamber, supporting column and bearing platform in the device chamber, the supporting column being configured to support the bearing platform; and an air outlet, first and second air inlet assemblies on the device chamber, the first and second air inlet assemblies being configured to introduce clean gas into the device chamber, and the air outlet being configured to discharge gas in the device chamber. The first and second air inlet assemblies are separately provided on the device chamber on the upper and lower sides of a bearing surface of the bearing platform; and one of the first and second air inlet assemblies is configured to clean the device chamber on a side of the bearing surface away from the supporting column, and other is configured to clean a gap between the supporting column and device chamber.
