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US Patent 12117347 Metrology target design for tilted device designs

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
October 6, 2016
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Date of Patent
October 15, 2024
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Patent Application Number
15287388
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Patent Citations
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US Patent 7478019 Multiple tool and structure analysis
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US Patent 7667842 Structure and method for simultaneously determining an overlay accuracy and pattern placement error
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US Patent 7925486 Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout
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US Patent 7933026 High resolution monitoring of CD variations
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US Patent 8214771 Scatterometry metrology target design optimization
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US Patent 8243256 Measurement apparatus for measuring an aberration of an optical system, measurement method, exposure apparatus, and device fabrication method
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US Patent 9291554 Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection
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US Patent 9355200 Method and apparatus for design of a metrology target
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US Patent 9581430 Phase characterization of targets
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US Patent 9739702 Symmetric target design in scatterometry overlay metrology
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•••
Patent Inventor Names
Michael E. Adel
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Myungjun Lee
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Daniel Kandel
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Eran Amit
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Mark D. Smith
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
12117347
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Patent Primary Examiner
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Akash Saxena
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CPC Code
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G03F 7/705
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H01L 22/30
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G01J 9/00
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G03F 7/70683
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G03F 7/70591
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