Patent attributes
Systems and methods are disclosed for circular stitching of images. For example, methods may include accessing a first image captured using a first image sensor; accessing a second image captured using a second image sensor; determining a cost table for a circular stitching boundary that includes overlapping regions of the first image and the second image; determining an extended disparity profile based on a periodic extension of the cost table and a smoothness criterion, wherein the extended disparity profile has a length greater than the width of the cost table; determining a binocular disparity profile of a length equal to the width of the cost table based on a contiguous subsequence of the extended disparity profile; and stitching the first image and the second image using the binocular disparity profile to obtain a combined image.