Patent 12130465 was granted and assigned to Applied Materials on October, 2024 by the United States Patent and Trademark Office.
An apparatus with a grating structure and a method for forming the same are disclosed. The grating structure includes forming a recess in a grating layer. A plurality of channels is formed in the grating layer to define slanted grating structures therein. The recess and the slanted grating structures are formed using a selective etch process.