Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chung-Liang Cheng0
Yen-Yu Chen0
Date of Patent
October 29, 2024
0Patent Application Number
183626760
Date Filed
July 31, 2023
0Patent Citations
0
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Patent Primary Examiner
Patent abstract
A method includes etching a dielectric layer to form a trench in the dielectric layer, depositing a metal layer extending into the trench, performing a nitridation process on the metal layer to convert a portion of the metal layer into a metal nitride layer, performing an oxidation process on the metal nitride layer to form a metal oxynitride layer, removing the metal oxynitride layer, and filling a metallic material into the trench using a bottom-up deposition process to form a contact plug.
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