Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Gerhard Ingmar Meijer0
Valery Weber0
Peter Willem Jan Staar0
Date of Patent
November 5, 2024
0Patent Application Number
172204120
Date Filed
April 1, 2021
0Patent Citations
Patent Primary Examiner
Patent abstract
Organometallic photoresists suitable for use in deep ultraviolet (DUV) or extreme ultraviolet (EUV) lithography are provided. The organometallic photoresists contain an organometallic molecule having least a metal element M selected from the group consisting of Bi, Sb, and mixtures thereof, and having an oxidation state of 3+, and at least one polymerizable group R. A method of forming a patterned materials feature on a substrate utilizing the organometallic photoresist compositions is also provided.
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