US Patent 6855225 Single-tube interlaced inductively coupling plasma source
Patent 6855225 was granted and assigned to Novellus Systems on February, 2005 by the United States Patent and Trademark Office.
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Patent abstract
A plasma source for use in, for example, semiconductor processing contains a radio-frequency generator, an impedance matching network, and a coil that encloses a tube. The coil is bifilar, i.e., the turns of one are interlaced with the turns of a second winding. The matching network supplies only a single coil in the plasma source, unlike conventional arrangements wherein a single matching network supplies multiple coils in the plasma source.
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Patent Inventor Names
David Lee Chen0
Vincent Bernard Decaux0
Yuh-Jia Su0
Date of Patent
February 15, 2005
0Patent Application Number
103510320
Date Filed
January 24, 2003
0Patent Primary Examiner
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US Patent 6855225 Single-tube interlaced inductively coupling plasma source
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